简介:采用X射线衍射(XRD)与X射线光电子能谱(XPS)研究黄铜矿在中度嗜热菌浸出过程中的表面产物变化。结果表明,在A.caldus,S.thermosulfidooxidans与L.ferriphilum浸出过程中,一硫化物(CuS)、二硫化物(S2-2)、元素硫(S0)、多硫化物(S2-n)与硫酸盐(SO2-4)是黄铜矿表面的主要产物。在A.caldus浸出黄铜矿过程速率较慢,这主要是由于黄铜矿的不完全溶解产生多硫化物,限制了进一步的溶解。在S.thermosulfidooxidans与L.ferriphilum浸出黄铜矿过程中,多硫化物与黄钾铁矾是钝化膜的主要成分。元素硫不是导致黄铜矿生物冶金过程钝化的主要物质。
简介:AnomalousLeakageCurrentinSilicon0xynitrideThinFilmsGrownbyMicrowaveExcitedNitrogenPlasmaNitridation.Applicationoftheexplosivemethodforcreatingnitrogenlayers;Brightplasmanitridingofferriticsteelwithseveralalloyingelements;Cleaningasthemostimportantsteptowardssuccessfulheattreatment
简介:[篇名]ActivatedMigrationSintering,[篇名]Activationofsteelsurfacesbyoxynitriding,[篇名]Activescreenplasmanitridingtechnology,[篇名]AdvancedPlasmaNitridingforAluminumandAluminumAlloys,[篇名]Ananti-corrosionandwear-resistingcompoundingnitridedlayeronprecisepressedpartsofsoftsteels,[篇名]Anexperimentalstudytocorrelatewaterjetimpingementerosionresistanceandpropertiesofmetallicmaterialsandcoatings,[篇名]AnInfluenceofSonBombardingontheEffectsofNitridinginD.C.GlowDischargePlasma。
简介:对一种用于嗜酸性氧化亚铁硫杆菌液氮冷藏新型保护剂GP的保藏效果进行研究。依据最大细胞复苏率及最高亚铁氧化活性确定该新型保护剂的最佳使用浓度。结果表明,保护剂的最佳浓度为30%,在此浓度下细胞复苏率达到84.4%,且能在120h内完全氧化培养基中的亚铁,培养6d后菌体浓度达到5.8×107cell/mL。此外,解冻细胞在9K培养基中培养6d后,对活细胞复苏的最佳GP残留浓度为0.6%(体积分数)。在此浓度下,菌株DC完全氧化亚铁需要108h,并且最终菌体浓度为6.8×107cell/mL.因此,GP是一种简单、有效的嗜酸性氧化亚铁硫杆菌液氮保藏的冷冻保护剂。
简介:CharacteristicsofsiliconoxynitridesmadebyECRplasmas;CharacterizationandcomparisonofPECVDsiliconnitrideandsiliconoxynitridedielectricforMIMcapacitors;CharacterizationofsiliconoxynitridethinfilmsdepositedbyECR-PECVD;Characterizationofsiliconoxynitridesandhigh-kdielectricmaterialsbyangle-resolvedX-rayphotoelectronspectroscopy
简介:[篇名]3-inchfull-colorOLEDdisplayusingaplasticsubstrate,[篇名]AsignificantimprovementinmemoryretentionofMFISstructurefor1T-typeferroelectricmemorybyrapidthermalannealing,[篇名]Accuratereliabilityevaluationofnon-uniformultrathinoxynitridcandhigh-klayers,[篇名]Advancedgatedielectricmaterialsforsub-100nmCMOS,[篇名]AINfilmscpitaxialyformedbydirectnitridationofsapphireusingaluminumoxynitridcasabufferlayer,[篇名]Amorphoussilicon-oxynitridcsubmicronfibres,[篇名]CharacteristicsofCr-Al-N-Othinfilmspreparedbypulsedlaserdeposition.
简介:[篇名]Astudyonfrictionandwearbehaviourofcarburized,carbonitridedandboridedAISI1020and5115steels,[篇名]AlloyCarburizationatTemperaturesof1,200-2,100F(650-1,150℃),[篇名]Amorphoussiliconcarbonitridefibersdrawnfromalkoxidemodifiedceraser,[篇名]Bearingswithincrcasedreliability,[篇名]Brightoutlookforhardcoatings,[篇名]Carbonitridccoatingbylow-temperaturediffusionprocess,[篇名]Carbonitridcnanomaterials,thinfilms,andsolids.