CharacteristicsofsiliconoxynitridesmadebyECRplasmas；CharacterizationandcomparisonofPECVDsiliconnitrideandsiliconoxynitridedielectricforMIMcapacitors；CharacterizationofsiliconoxynitridethinfilmsdepositedbyECR-PECVD；Characterizationofsiliconoxynitridesandhigh-kdielectricmaterialsbyangle-resolvedX-rayphotoelectronspectroscopy
表面工程：英文版
2005年2期
