简介:AdhesionimprovementofCVDdiamondfilimbyintroducinganelectro-depositedinterlayer;Agitation:themostversatiledegreeoffreedomforsurfacefinishers;Developmentofhydroxyapatitecoatingonporoustitaniumviaelectro-depositiontechnique;EffectofintensemagneticfieldonCdTeelectro-deposition;ElectrodepositionofMetallicLithiumonaTungstenElectrodein1-Butyl-l-methylpyrrolidiniumBis(tritluoromethanesulfone)imideRoom-temperatureMoltenSalt
简介:[篇名]Electro-depositionoftantalumontumgstenandnickelinLiF-NaF-CaF{sub}2meltcontainingK{sub}2TaF{sub}7electrochemicalstudy,[篇名]Electro-EpitaxialBufferLaycrsforREBCOTspeArchitectures,[篇名]EQCMwithair-gapexcitationelectrode.Calibrationtestswithcopperandoxygencoatings,[篇名]FormationofWell-definedNanocolumnsbyIonTrackingLithography,[篇名]Fundamentalexperimentalstudyonfreefabricationofnanocrystallinecopperbulkbyselectiveelectrodepositionwithelectrolytejet,[篇名]Magneticnanowirearraysobtainedbyelectro-depositioninorderedaluminatemplates,[篇名]Morphologicalcharacteristicsofnickelparticleselectrodepositedfromchloridedominantsolution.
简介:AComputationalStudyofGasPhaseChemistryinCarbonNanotubeSynthessbyPECVD;AfieldpointbasedapproachforsensorconditioninginMO-CVDreactors;AMethodforReal-TimeControlofThinFilmCompositionUsingOESandXPS;Amechanism-basedmodelofchemicalvapordepositionofepitaxialSi{sub}(1-x)Ge{sub}xflirts
简介:[篇名]1.55-umsilicon-basedreflection-typewaveguide-integratedthermo-opticswitch,[篇名]120×90ElementThermoelectricInfraredFocalPlaneArraywithPreciselyPatternedAu-blackAbsorber,[篇名]4H-SiCEpitaxialGrowthfcrHigh-PowerDevices,[篇名]A90nmgenerationcopperdualdamascenetechnologywithALDTaNbarrier,[篇名]Acomparativemicrotribologicalinvestigationofdiamond-likecarbonfilmsforapplicationsinmicrosystems,[篇名]Acomparisonofmicrocrystailinesiliconpreparedbyplasma-enhancedchemicalvapordepositionandhot-wirechemicalvapordeposition:electronicanddeviceproperties.
简介:复合环形气瓶爆破压力58MPa,未满足60MPa设计指标。气瓶水压爆破试验前依次经强度试验、气密性检查和疲劳试验。气瓶外层缠绕芳纶纤维,内衬为TC4钛合金超塑成形后激光焊接。运用多种分析手段开展内衬裂纹及断口的宏微观形貌分析、特征微区化学成分测定、焊缝金相组织检查。结果发现:在内衬内焊缝收弧焊趾部位存在裂纹源,裂纹源由数个微氧化脆性准解理小平面组成,源区与瞬断过渡区有疲劳条带特征。分析表明,裂纹源形成于焊接过程,在疲劳试验中发生疲劳扩展,而后爆破试验因裂纹前端应力强度因子达到临界值而发生失稳爆裂,裂纹性质为氢脆裂纹,属焊接气体保护不充分引起的环境吸氢。
简介:为研究复合离子液体中电沉积制备Ir的工艺过程,探讨添加剂N,N-二甲基乙酰胺(DMAC)对BMIC-BMIBF4复合离子液体黏度、电导率及电化学稳定性的影响,分析IrCl3在该复合体系中的电化学行为,并在不同电位下恒电位电沉积Ir层。采用扫描电镜及X射线衍射仪对沉积层形貌及组成进行表征。结果表明:DMAC的加入使复合体系的黏度降低、电导率升高、电化学稳定性提高;金电极上的循环伏安测试表明,Ir3+通过一步还原反应生成单质Ir的过程是受扩散速率控制的不可逆过程,其平均转移系数为0.170,扩散系数为1.096×10-6cm^2/s;SEM显示,在还原峰电位处可以获得较为致密、平整的Ir层,而XRD谱表明Ir层为多晶结构。