Fabrication of curved micro structures on photoresist layer

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摘要 Anovelfabricationprocessformicropatternswithcurvaturewasintroduced.Thecurvedstructuresweremadebycompensatingrectangularmicrostructureswithliquidphotoresistlayer.Becauseofthesurfacetensionoftheliquidinmicroscale,variousshapesofmeniscuscanbemadeonthemicrochannels.Themicrochannelsweremadeonthesiliconsubstrateinadvance,andthentheliquidlayerwascoatedonthemicrochannels.Fromthenatureofliquidbehavior,thecurvedpatternswithsmoothsurfaceareobtained,whichcannotbemadeeasilywiththeconventionalmechanicalmachining,aswellaswiththemicrofabricationprocesses,suchaswetanddryetching.Withthisprinciple,itisexpectedthatthesmoothandcurvedsurfacescanbemadebysimpleprocessesandtheresultscanbeappliedwidely,suchasopticalpatterns.
机构地区 不详
出版日期 2011年05月17日(中国期刊网平台首次上网日期,不代表论文的发表时间)
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