摘要
WereportthedepositionofNb2O5filmsonunheatedBK-7glasssubstratesusingremoteplasmasputteringsystem.Theremoteplasmageometryallowspseudoseparationofplasmaandtargetbiasparameters,whichofferscompletedepositionratecontrol.Usingappropriateoxygenflowrates,high-densityandlow-lossNb2O5filmsaredepositedwithratesupto0.49nm/s.Lowerdepositionrates(~0.026nm/s)canalsobeobtainedbyworkingatlowtargetcurrentandvoltageandatlowpressure.Nb2O5filmsdepositedatdifferentrateshavetherefractiveindexofabout2.3andtheextinctioncoefficientaslowas6.9×10-5.
出版日期
2013年02月12日（中国期刊网平台首次上网日期，不代表论文的发表时间）
