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2000年2期
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Preparation and Analysis of Si3N4 Film
Preparation and Analysis of Si3N4 Film
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摘要
未填写
DOI
54kww9p34k/1044057
作者
程绍玉;任兆杏;梁荣庆;吕庆敖;刘卫;宁兆元
机构地区
不详
出处
《等离子体科学与技术:英文版》
2000年2期
关键词
分类
[核科学技术][核技术及应用]
出版日期
2000年02月12日(中国期刊网平台首次上网日期,不代表论文的发表时间)
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3
LIUJian-hua;ZHANGGui-cai;等.
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4
.
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.材料科学与工程,1998-02.
5
CHEN Junhong ZHAN Huasheng XIE Jing SUN Jialin.
High-temperature Reaction of Silica Fume- Si3N4 System
.硅酸盐工业,2009-03.
6
WANGLinjun;TIANShunzhi;等.
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.硅酸盐工业,2003-01.
7
.
High Temperature Creep behaviour of a Si3N4 Whisker Reinforced Al-Fe-V-Si Composite
.材料科学与工程,1998-06.
8
张延惠;宋一中;谢行恕.
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.化学,1996-04.
9
尹立峰;王思青;张长瑞;崔岩;徐晓燕.
制备工艺对CVD Si3N4涂层沉积速率的影响
.材料科学与工程,2008-01.
10
陈国平.
Si3N4/铁基结合剂氮化金刚石薄膜涂层节块
.刀具与模具,1998-03.
来源期刊
等离子体科学与技术:英文版
2000年2期
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